The development opportunities and challenges of the borophosphosilicate glass (BPSG) industry coexist and there is huge room for future growth.

Boro-phospho-silicate Glass, or BPSG for short, refers to a silicon oxide layer formed by simultaneously doping phosphorus impurities and boron impurities into silicon dioxide (SiO2). It is often used in the front-end manufacturing process of semiconductor chips. The front-end manufacturing process of semiconductor chips mainly includes oxidation diffusion, thin film deposition, glue development, photolithography, ion…